Study on ion hammering behavior in SiO glass for three-dimensional modification of oxide materials by the ion micro-beam irradiation system

Inoue, Aichi

no journal, , 

In order to understand the ion hammering phenomena in oxides materials, relation between compaction behavior and irradiation conditions was investigated in fused and synthetic silica glasses. Depth of grooves, formed on the surfaces of the fused silica by O ion irradiation, increased with increasing in ion fluence and saturated at a fluence of 210 ions/cm. Ratio of the depth for the incident ion range was constant in the range of the incident energy between 0.5 and 15 MeV. Dependence of compaction behavior on ion species was not explained by electronic and nuclear energy depositions, but by the effective ion track radii. It was found that the fused silica was easily compacted than the synthetic one, but ion induced luminescence behaviors are similar to each other. These results indicated that ion hammering behavior in silica glass was not based on defects creation process but on one of possibilities suggested to thermal spike effects.