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論文

In situ X-ray diffraction study of the oxide formed on alloy 600 in borated and lithiated high-temperature water

渡邉 真史*; 米澤 利夫*; 菖蒲 敬久; 城 鮎美; 庄子 哲雄*

Corrosion, 72(9), p.1155 - 1169, 2016/09

 被引用回数:1 パーセンタイル:6.15(Materials Science, Multidisciplinary)

In situ X-ray diffraction (XRD) measurements of the oxide film formed on Alloy 600 in borated and lithiated high-temperature water were conducted to demonstrate a capability to investigate rapid changes in oxide films during transient water chemistry conditions. In the presence of dissolved hydrogen (DH) = 30 cm$$^{3}$$/kg [H$$_{2}$$O] and dissolved oxygen (DO) $$<$$ 0.06 ppm, only spinel oxides were detected and no significant NiO peak was found even after 1,220 h exposure. By contrast, once the DO was increased to 8 ppm, a NiO peak grew rapidly. Within 7 h, the amount of NiO became comparable to that of spinel oxide. However, when DO was decreased again below 0.3 ppm and DH was increased up to 30 cm$$^{3}$$/kg [H$$_{2}$$O], the ratio of NiO to spinel did not change during 10 h. Thus, the rate of dissolution of NiO in DH = 30 cm$$^{3}$$/kg water seemed to be lower than the growth rate of NiO in high DO conditions.

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