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Effect of Cl ion implantation on electrical properties of CuInSe$$_{2}$$ thin films

Tanaka, Toru*; Yamaguchi, Toshiyuki*; Oshima, Takeshi; Ito, Hisayoshi; Wakahara, Akihiro*; Yoshida, Akira*

Single crystalline CuInSe$$_{2}$$ thin films grown on GaAs were implanted with Cl ions at room temperature. The mean concentration of Cl ranges from 5E17 to 5E19 /cm$$^{3}$$. Residual defects introduced in implantated layer are removed by annealing at 400$$^{circ}$$C in N$$_{2}$$. As a result of Hall effects measuremant, electron concentration in implanted layer increases with increasing implanted Cl concentration. This result suggests that Cl acts as donor in CuLnSe$$_{2}$$. Ionizing energy of Cl is estimated to be 78 meV from the temperature dependence of electron concentation.

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