Spatial uniformity of negative ion production in volume negative ion source

Morishita, Takatoshi; Miyamoto, Kenji*; Fujiwara, Yukio*; Hanada, Masaya; Kitagawa, Tadashi*; Kashiwagi, Mieko; Okumura, Yoshikazu; Watanabe, Kazuhiro

no abstracts in English

Language	:	English
Journal	:	Review of Scientific Instruments
Volume	:	73
Number	:	2
Pages	:	p.1064 - 1066
Publication Year/Month	:	2002/02
Meeting title	:	9th International Conference on Ion Sources (ICIS '01)
Held date	:	2001/09
Location (city)	:	Oakland
Location (country)	:	U. S. A.
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1063/1.1430527
DOI for research data	:
Keywords	:	負イオン源; ビーム一様性; セシウム効果; 表面生成
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:18.93 Category:Instruments & Instrumentation
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Registration No. : B20010774
JAEA Abstracts No. : 300562
Paper Submission No. : 19093

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