• help
  • PC | SP
  • JP | EN
          
Refine your search：     
Report No.
 - 
Clear All
Return to the previous page

SPM investigation of C$$_{60}$$ thin films irradiated with energetic ions

Narumi, Kazumasa; Naramoto, Hiroshi

Transformation of C$$_{60}$$ thin films on Si(111) substrates by irradiation with 360 keV $$^{40}$$Ar$$^{+}$$ and $$^{40}$$Ar$$^{4+}$$ ions at fluences of 1.0$$times$$10$$^{12}$$/cm$$^{2}$$ to 1.1$$times$$10$$^{16}$$/cm$$^{2}$$ was investigated by atomic force microscopy. As-prepared insulating films become conductive after the irradiation up to the fluence of 1.1$$times$$10$$^{14}$$/cm$$^{2}$$, where the film is found to be almost transformed into a form of amorphous carbon by Raman-spectroscopy analysis. This results from conductive carbon species due to decomposition of the C$$_{60}$$ molecule. Considerable topographic change is observed up to the fluence of 1.1$$times$$10$$^{15}$$/cm$$^{2}$$ where the lines characteristic of the C$$_{60}$$ film fade out of the Raman spectra, which is due to sputtering and to densification of the C$$_{60}$$ molecule.

Language

 :

English

Journal

 :

Proceedings of 3rd International Symposium on Atomic Level Characterizations for New Materials and Devices '01 (ALC '01)

Volume

 :

Number

 :

Pages

 :

p.322 - 325

Publication Year/Month

 :

2001/11

Meeting title

 :

3rd International Symposium on Atomic Level Characterizations for New Materials and Devices '01 (ALC '01)

Held date

 :

2001/11

Location (city)

 :

Nara

Location (country)

 :

Japan

Patent information

 :

PDF

 :


Paper URL

 :

DOI for research data

 :

Keywords

 :

C$$_{60}$$; Si; イオン照射; 走査型プローブ顕微鏡; ラマン分光; 薄膜

Research Facility

 :

TIARA(イオン照射研究施設)

Press Release

 :

Article of JAEA R&D Review

 :

Cooperating Institute

 :

Accesses

 :

- Accesses

InCites™

 :

Altmetrics

 :

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.

Return to the previous page