High-quality epitaxial TiO $_{2}$ thin films grown on -Al $_{2}$ O $_{3}$ substrates by pulsed laser deposition

Shinohara, Ryuji*; Yamaki, Tetsuya; Yamamoto, Shunya; Ito, Hisayoshi; Asai, Keisuke*

no abstracts in English

Language	:	English
Journal	:	Journal of Materials Science Letters
Volume	:	21
Number	:	12
Pages	:	p.967 - 969
Publication Year/Month	:	2002/06
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Paper URL	:	https://doi.org/10.1023/A:1016090110315
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Keywords	:	Titanium Dioxide (TiO $_{2}$ ); Laser Ablation; Epitaxial Growth; Crystal Structure; Surface Morphology
Research Facility	:	TIARA(イオン照射研究施設)
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Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:36.89 Category:Materials Science, Multidisciplinary
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Registration No. : A20020027
JAEA Abstracts No. : 301034
Paper Submission No. : 19471

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High-quality epitaxial TiO thin films grown on -AlO substrates by pulsed laser deposition

High-quality epitaxial TiO $_{2}$ thin films grown on -Al $_{2}$ O $_{3}$ substrates by pulsed laser deposition