使用言語 |
: | English |
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掲載資料名 |
: | |
巻 |
: | 216 |
号 |
: | 1-4 |
ページ数 |
: | p.395 - 401 |
発行年月 |
: | 2003/06 |
発表会議名 |
: | 4th International Symposium on Control of Semiconductor Interfaces |
開催年月 |
: | 2002/10 |
開催都市 |
: | Karuizawa |
開催国 |
: | Japan |
キーワード |
: | Real-time Monitoring; Oxidation; Ti(0001); Oxygen; Synchrotron Radiation; Photoelectron Spectroscopy; RHEED; AES |
論文URL |
: |
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使用施設 |
: | |
論文解説記事 |
: |
Access |
: |
- Accesses |
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InCites™ |
: |
パーセンタイル:65.04 分野:Chemistry, Physical |
Altmetrics |
: |
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