Electron beam-induced reactions of a sulfonium salt in the solid state for chemically amplified electron beam resists; Comparison with photolytic reactions

Moon, S.; Maekawa, Yasunari; Yoshida, Masaru

no abstracts in English

Language	:	English
Journal	:	Journal of Photopolymer Science and Technology
Volume	:	15
Number	:	3
Pages	:	p.423 - 426
Publication Year/Month	:	2002/06
Meeting title	:	19th Conference of Photopolymer Science and Technology
Held date	:	2002/06
Location (city)	:	Chiba
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.2494/photopolymer.15.423
DOI for research data	:
Keywords	:	電子線; スルホニウム塩; レジスト; 酸発生剤
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
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Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:9.44 Category:Polymer Science
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Registration No. : B20020449
JAEA Abstracts No. : 300978
Paper Submission No. : 19424

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