Hydrogen separation in H $_{2}$ -H $_{2}$ O-HI gaseous mixture using the silica membrance prepared by chemical vapor deposition

Hwang, G.*; Onuki, Kaoru; Shimizu, Saburo; not registered

no abstracts in English

Language	:	English
Journal	:	J. Membr. Sci.
Volume	:	162
Number	:	1-2
Pages	:	p.83 - 90
Publication Year/Month	:	1999/00
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Patent information	:
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Paper URL	:	https://doi.org/10.1016/S0376-7388(99)00125-8
DOI for research data	:
Keywords	:	Inorganic Membranes; Silica-alumina Membranes; Chemical Vapor Deposition; Gas Separations; Hydrogen Permselectivity
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Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:90.09 Category:Engineering, Chemical
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Registration No. : A19980078
JAEA Abstracts No. : 271276
Paper Submission No. : 17011

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Hydrogen separation in H-HO-HI gaseous mixture using the silica membrance prepared by chemical vapor deposition

Hydrogen separation in H $_{2}$ -H $_{2}$ O-HI gaseous mixture using the silica membrance prepared by chemical vapor deposition