Effect of stress and impurities on preferential amorphization on grain boundaries in polycrystalline silicon

Takeda, Mitsuhiro*; Onuki, Somei*; Watanabe, Seiichi*; Abe, Hiroaki; Naramoto, Hiroshi; P.R.Okamoto*; N.Q.Lam*

no abstracts in English

Language	:	English
Journal	:	Mat. Res. Soc. Symp. Proc.
Volume	:	540
Number	:
Pages	:	p.37 - 42
Publication Year/Month	:	1999/00
Meeting title	:	Materials Research Society 1998 Fall Meeting
Held date	:	1998/12
Location (city)	:	America
Location (country)	:
Patent information	:
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Paper URL	:
DOI for research data	:
Keywords	:	Silicon; Grain-boundary; Radiation-effect; Amorphization; Stress-effect; Impurity-effect
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
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Registration No. : B19980518
JAEA Abstracts No. : 271005
Paper Submission No. : 16800

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