Study of plasma uniformity on JT-60 negative ion source

Kawai, Mikito; Grisham, L. R.*; Ito, Takao; Kazawa, Minoru; Kuriyama, Masaaki; Mogaki, Kazuhiko; Okumura, Yoshikazu; Watanabe, Kazuhiro

no abstracts in English

Language	:	English
Journal	:	Review of Scientific Instruments
Volume	:	71
Number	:	2
Pages	:	p.755 - 757
Publication Year/Month	:	2000/02
Meeting title	:	8th International Conference on Ion Sources (ICIS '99)
Held date	:	1999/09
Location (city)	:	Kyoto
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1063/1.1150284
DOI for research data	:
Keywords	:	JT-60 N-NBI; 負イオン源; 負イオン生成部; アークチャンバ; ソースプラズマ
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:55.17 Category:Instruments & Instrumentation
Altmetrics	:

Registration No. : B19990163
JAEA Abstracts No. : 280258
Paper Submission No. : 17265

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.