Dose dependence of the production yield of endohedral $^{133}$ Xe-fullerene by ion implantation

Watanabe, Satoshi; Ishioka, Noriko; Shimomura, Haruhiko*; Muramatsu, Hisakazu*; Sekine, Toshiaki

no abstracts in English

Language	:	English
Journal	:	Nuclear Instruments and Methods in Physics Research B
Volume	:	206
Number	:	1-4
Pages	:	p.399 - 402
Publication Year/Month	:	2003/05
Meeting title	:	13th International Conference on Ion Beam Modification of Materials (IBMM 2002)
Held date	:	2002/09
Location (city)	:	Kobe
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1016/S0168-583X(03)00771-7
DOI for research data	:
Keywords	:	イオン注入; $^{133}$ Xe; $^{133}$ Xe内包フラーレン; 生成率; イオン照射量; 注入エネルギー; HPLC; 無定形炭素化
Research Facility	:
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Article of JAEA R&D Review	:
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InCites™	:	Percentile:50.24 Category:Instruments & Instrumentation
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Registration No. : B20020622
JAEA Abstracts No. : 320046
Paper Submission No. : 20596

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Dose dependence of the production yield of endohedral Xe-fullerene by ion implantation

Dose dependence of the production yield of endohedral $^{133}$ Xe-fullerene by ion implantation