Time-resolved X-ray diffraction study on surface structure and morphology during molecular beam epitaxy growth

Takahashi, Masamitsu; Yoneda, Yasuhiro   ; Inoue, Hirotane*; Yamamoto, Naomasa*; Mizuki, Junichiro

The reflection high energy electron diffraction (RHEED) oscillation has been widely adopted for studies on growth kinetics and dynamics in molecular beam epitaxy (MBE). Recent development in brilliant X-ray source has enabled similar experiments with X-rays, which has great advantage in a straightforward interpretation of results and in a high angular resolution. In general, the diffracted intensity from surface is proportional to the surface structure factor associated with the surface reconstruction, F, multiplied by a damping factor associated with the surface roughness, m. We show that the two factors, F and m, can be obtained separately by measuring diffuse scattering around the two-dimensional Bragg peak during growth.