Fluorine-doping in titanium dioxide by ion implantation technique

Yamaki, Tetsuya; Umebayashi, Tsutomu; Sumita, Taishi*; Yamamoto, Shunya; Maekawa, Masaki; Kawasuso, Atsuo; Ito, Hisayoshi

Single crystalline titanium dioxide (TiO) rutile were implanted with 200keV F at a nominal fluence of 110 to 110 ions cm and then thermally annealed in air up to 1200 for 5h. The radiation damage and its recovery during the subsequent annealing were analyzed by Rutherford backscattering spectrometry in channeling geometry and variable-energy positron annihilation spectroscopy. The lattice disorder was completely annealed at 1200 by the diffusion of point defects to the surface acting as a sink. According to the secondary ion mass spectrometry, the F depth profile was shifted to a shallower region along with the damage recovery, finally producing an F-doped layer where the impurity concentration increased steadily towards the surface. The F doping proved to provide a small modification to the conduction-band edge of TiO, as assessed by theoretical band calculations.