Formation process of -FeSi $_{2}$ on Si(111) substrate studied by means of SR-XPS

Saito, Takeru; Yamamoto, Hiroyuki; Haraguchi, Masaharu*; Imamura, Motoyasu*; Matsubayashi, Nobuyuki*; Tanaka, Tomoaki*; Shimada, Hiromichi*; Hojo, Kiichi

no abstracts in English

Language	:	English
Journal	:	Photon Factory Activity Report 2001
Volume	:
Number	:	19
Pages	:	P. 205
Publication Year/Month	:	2001/00
Meeting title	:
Held date	:
Location (city)	:
Location (country)	:
Patent information	:
PDF	:
Paper URL	:	http://pfwww.kek.jp/acr2001pdf/PartB/PF01UR205.pdf
DOI for research data	:
Keywords	:	-FeSi $_{2}$ ; 放射光; XPS; 深さ方向分析; 非破壊; 拡散
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:
Altmetrics	:

Registration No. : A20020308
JAEA Abstracts No. :
Paper Submission No. :

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.

Formation process of -FeSi on Si(111) substrate studied by means of SR-XPS

Formation process of -FeSi $_{2}$ on Si(111) substrate studied by means of SR-XPS