Polyvinylidene fluoride microfilter formation by $^{35}$ Cl $^{9+}$ , $^{58}$ Ni $^{10+}$ , and $^{63}$ Cu $^{11+}$ ion bombardment and alkali etching

Komaki, Yoshihide; not registered; Sakurai, Tsutomu; Morishita, Norio; not registered

no abstracts in English

Language	:	English
Journal	:	Nuclear Instruments and Methods in Physics Research B
Volume	:	34
Number	:
Pages	:	p.332 - 336
Publication Year/Month	:	1988/00
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Paper URL	:	https://doi.org/10.1016/0168-583X(88)90053-5
DOI for research data	:
Keywords	:	Microfilter
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Article of JAEA R&D Review	:
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Registration No. : A19870521
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Polyvinylidene fluoride microfilter formation by Cl, Ni, and Cu ion bombardment and alkali etching

Polyvinylidene fluoride microfilter formation by $^{35}$ Cl $^{9+}$ , $^{58}$ Ni $^{10+}$ , and $^{63}$ Cu $^{11+}$ ion bombardment and alkali etching