Application of high-energy X-ray photoelectron spectroscopy using synchrotron-radiation to the depth profile analysis of ion implanted layer on Si(100) surface

Yamamoto, Hiroyuki; Baba, Yuji ; Sasaki, Teikichi

no abstracts in English

Language	:	English
Journal	:	Photon Factory Activity Report
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Number	:	13
Pages	:	P. 352
Publication Year/Month	:	1995/00
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Keywords	:	X線光電子分光法; 放射光; 深さ方向分析; イオン注入; Si(100)
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Registration No. : A19960048
JAEA Abstracts No. : 250534
Paper Submission No. : 14790

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