Comparison between electron yield, PSD ion yield, and surface pipico yield in near C and O K-edge XAFS in condensed methyl formate-D

Sekiguchi, Tetsuhiro ; Sekiguchi, Hiromi*; not registered; Tanaka, Kenichiro*

no abstracts in English

Language	:	English
Journal	:	J. Phys., IV
Volume	:	7
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Pages	:	p.505 - 506
Publication Year/Month	:	1997/00
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Keywords	:	光刺激脱離; 光イオン-光イオン-コインシデンス; 表面光化学反応; 多価イオン; ギ酸メチル; 共鳴内殻励起; パルス放射光; 飛行時間質量分析法
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Registration No. : A19960394
JAEA Abstracts No. : 260549
Paper Submission No. : 15562

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