Multi-ampere negative hydrogen ion source for fusion application

Inoue, Takashi; Araki, Masanori; Hanada, Masaya; Kurashima, Toru*; Matsuda, Shinzaburo; not registered; Ohara, Yoshihiro; Okumura, Yoshikazu; Tanaka, Shigeru; Watanabe, Kazuhiro

no abstracts in English

Language	:	English
Journal	:	Nuclear Instruments and Methods in Physics Research B
Volume	:	37-38
Number	:
Pages	:	p.111 - 115
Publication Year/Month	:	1989/00
Meeting title	:	7th Int. Conf. on Ion Implantation Technology
Held date	:	1988/06
Location (city)	:	京都
Location (country)	:
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1016/0168-583X(89)90146-8
DOI for research data	:
Keywords	:	Ion Source
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:91.59 Category:Instruments & Instrumentation
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Registration No. : B19880127
JAEA Abstracts No. :
Paper Submission No. : 9407

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