Electron beam curing of dimer acids-based urethane acrylates for pressure sensitive adhesives

Sasaki, T.; Takeda, Satoe*; Shiraishi, Katsutoshi*

no abstracts in English

Language	:	English
Journal	:	JAERI-Conf 95-003
Volume	:
Number	:
Pages	:	p.424 - 427
Publication Year/Month	:	1995/03
Meeting title	:	6th Japan-China Bilateral Symposium on Radiation Chemistry
Held date	:	1994/11
Location (city)	:	Tokyo
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:
DOI for research data	:
Keywords	:	Electron Beam; Curing; Dimer Acids; Urethane Acrylate; Pressure Sensitive Adhesives
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
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Registration No. : B19940750
JAEA Abstracts No. :
Paper Submission No. : 27224

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