Effect of treatment for Si substrate on the crystal structure of -FeSi $_{2}$ thin film

Haraguchi, Masaharu; Yamamoto, Hiroyuki; Yamaguchi, Kenji; Sasase, Masato*; Nakanoya, Takamitsu ; Saito, Takeru; Hojo, Kiichi

no abstracts in English

Language	:	Japanese
Journal	:	Shinku
Volume	:	45
Number	:	10
Pages	:	p.749 - 753
Publication Year/Month	:	2002/10
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Paper URL	:	https://doi.org/10.3131/jvsj.45.749
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Keywords	:	-FeSi $_{2}$ ; 環境半導体; 基板処理; 薄膜; 結晶構造; X線回折; イオンビームスパッタ蒸着法; 拡散
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Registration No. : A20020408
JAEA Abstracts No. : 310083
Paper Submission No. : 19747

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Effect of treatment for Si substrate on the crystal structure of -FeSi thin film

Effect of treatment for Si substrate on the crystal structure of -FeSi $_{2}$ thin film