Synthesis of sulfur-doped TiO by ion implantation

Umebayashi, Tsutomu; Yamaki, Tetsuya; Yamamoto, Shunya; Tanaka, Shigeru; Asai, Keisuke*

TiO is promising as a photocatalytic material. However, it is active only under UV light irradiation because of its wide band gap (3.0 eV). We recently reported that sulfur (S) doping caused the optical absorption edge of TiO to be shifted into the lower energy region. Based on the theoretical analyses using first principles band calculations, mixing of the S 3p states with the valence band was found to contribute to the bandgap narrowing. In this study presented here, S-doped TiO was prepared by ion implantation and subsequent thermal annealing. S was implanted into the single crystals of rutile TiO with a fluence of 8 10 ions/cm. According to the results of RBS/channeling analysis, irradiation damage recovered after the annealing at 600 C in air. In the annealed crystal, S atoms occupied O sites to form Ti-S bonds, as assessed by XPS.