Stability of a silica membrane prepared by CVD using - and -alumina tube as the support tube in the Hi-H $_{2}$ O gaseous mixture

Hwang, G.*; Kim, J.*; Choi, H.*; Onuki, Kaoru

no abstracts in English

Language	:	English
Journal	:	Journal of Membrane Science
Volume	:	215
Number	:	1-2
Pages	:	p.293 - 302
Publication Year/Month	:	2003/04
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Paper URL	:	https://doi.org/10.1016/S0376-7388(03)00022-X
DOI for research data	:
Keywords	:	Inorganic Membranes; Silica-almina Membranes; Chemical Vapor; Deposition; Gas Separation; Hydrogen Permselectivity
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Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:56.33 Category:Engineering, Chemical
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Registration No. : A20020647
JAEA Abstracts No. : 310644
Paper Submission No. : 20158

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Stability of a silica membrane prepared by CVD using - and -alumina tube as the support tube in the Hi-HO gaseous mixture

Stability of a silica membrane prepared by CVD using - and -alumina tube as the support tube in the Hi-H $_{2}$ O gaseous mixture