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Improvement of luminescence capability of Tb$$^{3+}$$-related emission by Al$$_{x}$$Ga$$_{1-x}$$N

Nakanishi, Yasuo*; Wakahara, Akihiro*; Okada, Hiroshi*; Yoshida, Akira*; Oshima, Takeshi; Ito, Hisayoshi

Luminescence propeties of Tb-doped Al$$_{x}$$Ga$$_{1-x}$$N were studied. The samples were grown on sapphire substrates using OMVPE. Tb implantation was cariied out to introduce Tb into samples. After implantation, samples were annealed at 1000 to 1150 $$^{o}$$C in 10% NH$$_{3}$$ diluted with N$$_{2}$$. The luminescence intensity for Al$$_{x}$$Ga$$_{1-x}$$N x=0.1 is 5 times stronger than that for x=0 at 14 K. The luminesecence intensity for GaN rapidly decreases with temperature and its activation enegy is 7.8 meV. With increasing Al content, the activation enegy increases, and the activation energy for Al$$_{0.1}$$Ga$$_{0.9}$$N is 70 meV.

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Category:Physics, Condensed Matter

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