Orientational ordering of iron silicide films on sputter etched Si substrate

Igarashi, Shinichi*; Katsumata, Toshinobu*; Haraguchi, Masaharu*; Saito, Takeru*; Yamaguchi, Kenji; Yamamoto, Hiroyuki; Hojo, Kiichi

no abstracts in English

Language	:	English
Journal	:	Vacuum
Volume	:	74
Number	:	3-4
Pages	:	p.619 - 624
Publication Year/Month	:	2004/06
Meeting title	:	7th International Symposium on Sputtering and Plasma Process (ISSP 2003)
Held date	:	2003/06
Location (city)	:	Kanazawa
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1016/j.vacuum.2004.01.035
DOI for research data	:
Keywords	:	鉄シリサイド; 透過型電子顕微鏡; X線回折; イオン照射; 薄膜
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:27.83 Category:Materials Science, Multidisciplinary
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Registration No. : B20030460
JAEA Abstracts No. : 320701
Paper Submission No. : 21133

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