Development of 13 GHz compact electron cyclotron resonance ion source

Saito, Yuichi; Okoshi, Kiyonori ; Arakawa, Kazuo

An extremely compact, all-permanent-magnet electron cyclotron resonance ion source was designed and manufactured mainly for materials development. The ion source was installed to the 400kV ion implanter, and heavy ion beam in a MeV energy region with high beam current was available using multiply charged ions from the ion source. In the preliminary result at the test stand, the Ar beam of 80 microA and He beam of 100 microA were available and the Ar beam was obtained at the extraction voltage of 13.5kV with microwave power of only 8W.