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Development of 13 GHz compact electron cyclotron resonance ion source

Saito, Yuichi; Okoshi, Kiyonori ; Arakawa, Kazuo

An extremely compact, all-permanent-magnet electron cyclotron resonance ion source was designed and manufactured mainly for materials development. The ion source was installed to the 400kV ion implanter, and heavy ion beam in a MeV energy region with high beam current was available using multiply charged ions from the ion source. In the preliminary result at the test stand, the Ar$$^{4+}$$ beam of 80 microA and He$$^{2+}$$ beam of 100 microA were available and the Ar$$^{12+}$$ beam was obtained at the extraction voltage of 13.5kV with microwave power of only 8W.

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Category:Instruments & Instrumentation

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