Laser produced plasma for EUV light source for lithography

Nishihara, Katsunobu*; Nishimura, Hiroaki*; Mochizuki, Takayasu*; Sasaki, Akira

no abstracts in English

Language	:	Japanese
Journal	:	Reza Kenkyu
Volume	:	32
Number	:	5
Pages	:	p.330 - 336
Publication Year/Month	:	2004/05
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Paper URL	:	https://doi.org/10.2184/lsj.32.330
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Keywords	:	EUV; リソグラフィ; プラズマ分光; 原子過程; シミュレーション
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Registration No. : A20030326
JAEA Abstracts No. : 330226
Paper Submission No. : 21628

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