SR-excited process

Teraoka, Yuden

The current status of microprocesses using synchrotron radiation in Japan was reviewed. The SR-excited process is followed by SR-excited surface modification, SR-excited crystal growth and SR-excited etching. The SR-excited surface modification is followed by SR-gas-excited surface modification and SR-direct-excited surface modification. The SR-excited crystal growth is followed by SR-excited atomic layer epitaxy and SR-excited chemical vapor deposition. THe SR-excited etching is followed by SR-direct-excited etching, SR-gas-excited etching and SR ablation.

Language	:	Japanese
Journal	:	Nano Tekunoroji Daijiten
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Pages	:	p.340 - 351
Publication Year/Month	:	2003/12
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Keywords	:	Synchrotron Radiation; Microprocess; Surface Modification; Crystal Growth; Etching; Atomic Layer Epitaxy; Chemical Vapor Deposition; Ablation
Research Facility	:	SPring-8(大型放射光施設)
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Registration No. : A20030411
JAEA Abstracts No. :
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