Role of UV light illumination and DMF soaking in production of PET ion track membranes

PETイオン穿孔膜作製におけるUV照射及びDMF浸漬効果

Zhu, Z.; 前川 康成; 越川 博; 鈴木 康之; 米澤 宣行*; 吉田 勝

Zhu, Z.; Maekawa, Yasunari; Koshikawa, Hiroshi; Suzuki, Yasuyuki; Yonezawa, Noriyuki*; Yoshida, Masaru

イオン穿孔膜の電子デバイスや分離膜への応用を目的に、イオン穿孔膜微細孔の孔径分布を小さくする(均一な微細孔を作る)ため、イオンビーム照射後のポリエチレンナフタレート(PET)膜への紫外線照射効果、DMF等の有機溶媒への浸蹟効果について検討した。波長が310nm以上の紫外線照射と30分以上のDMF処理を組合せることで、イオンビームダメージ領域のエッチング感度が25倍向上し、孔径が50nm以下の円柱状孔が作製できることを見いだした。

The pretreatment effects using UV light illumination and DMF soaking on bulk and track etching rates of PET films were investigated. The wavelength of illuminated UV light plays an important role in sensitizing track etching. Illumination with the light at wavelengths longer than 320nm showed strong enhancement in the track etching rates without influence on the bulk etching rates, whereas light with the wavelengths lower than 320nm causes large enhancement in both track and bulk etching rates even in the interior of the material. The track etching rate is found to be not constant along ion tracks, which is attributed to the inhomogeneous distribution of reactive chemical species induced during post-UV light illumination. Furthermore, the DMF soaking of PET after UV light illumination can enhance the etching sensitivity of the track by more than 100 times. The phenomenon is attributed to the high diffusion of organic solution along tracks after UV light illumination.