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Report No.

Hydrogen bubble formation in H-implanted ZnO studied using a slow positron beam

Chen, Z. Q.; Maekawa, Masaki; Kawasuso, Atsuo; Yamamoto, Shunya; Yuan, X. L.*; Sekiguchi, Takashi*; Suzuki, Ryoichi*; Odaira, Toshiyuki*

20-80 keV hydrogen ions were implanted into ZnO single crystals up to a total dose of 4.4$$times$$10$$^{15}$$ cm$$^{-2}$$. Positron annihilation measurements using a slow positron beam revealed introduction of vacancies after implantation, which are filled with hydrogen impurities. After annealing, these hydrogen filled vacancies grow into large hydrogen bubbles. At annealing temperature of 500-700$$^{circ}$$C, these hydrogen impurities are released from the bubbles, and remain open microvoids. These microvoids are finally annealed out at about 1100$$^{circ}$$C. The effects of hydrogen implantation on the light luminescence in ZnO will also be discussed.



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