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Study of interdiffused layers in the surface and interfaces of multilayers by total-reflection soft-X-ray fluorescence spectroscopy

Imazono, Takashi; Yanagihara, Mihiro*

Using soft-X-ray fluorescence spectroscopy with photon incidence at a critical angle of total reflection, it was made clear that SiO$$_2$$ existed within a depth of a few nanometers from the surface of Fe/Si multilayers. It was generated by oxidation of the interdiffused Fe$$_3$$Si layer nearest to the topmost Fe layer. Consequently, the Fe$$_3$$Si layer was found to decrease in thickness. This result suggests that the total-reflection soft-X-ray fluorescence spectroscopy is fairly useful to analyze the chemical state of elements to a depth of a few nanometers from the surface.



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