Comparison of 80keV D $^{+}$ ion implantation with thermal D $_{2}$ doping in silica by FTIR and ESR spectroscopy

Saeki, Masakatsu; Ono, Shinichi; Tachikawa, Enzo; not registered; not registered; not registered

no abstracts in English

Language	:	English
Journal	:	J.Am.Ceram.Soc.
Volume	:	68
Number	:	3
Pages	:	p.151 - 155
Publication Year/Month	:	1985/00
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Paper URL	:	https://doi.org/10.1111/j.1151-2916.1985.tb09655.x
DOI for research data	:	Link to research data related to this paper/report.
Keywords	:	D atom; Ion implantation; FT-IR; ESR; -ray irradiation; Bond rupture; Radiation damage
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Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:63.49 Category:Materials Science, Ceramics
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Registration No. : A19844213
JAEA Abstracts No. :
Paper Submission No. : 7389

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Comparison of 80keV D ion implantation with thermal D doping in silica by FTIR and ESR spectroscopy

Comparison of 80keV D $^{+}$ ion implantation with thermal D $_{2}$ doping in silica by FTIR and ESR spectroscopy