Effect of the satellite lines and opacity on the extreme ultraviolet emission from high-density Xe plasmas

Sasaki, Akira; Nishihara, Katsunobu*; Murakami, Masakatsu*; Koike, Fumihiro*; Kagawa, Takashi*; Nishikawa, Takeshi*; Fujima, Kazumi*; Kawamura, Toru*; Furukawa, Hiroyuki*

no abstracts in English

Language	:	English
Journal	:	Applied Physics Letters
Volume	:	85
Number	:	24
Pages	:	p.5857 - 5859
Publication Year/Month	:	2004/12
Meeting title	:
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Patent information	:
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Paper URL	:	https://doi.org/10.1063/1.1834994
DOI for research data	:
Keywords	:	EUV; リソグラフィ; レーザー生成プラズマ; プラズマ分光; 原子過程; 輻射輸送; Xe
Research Facility	:
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Article of JAEA R&D Review	:
Cooperating Institute	:	大阪大学レーザーエネルギー学研究センター

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Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:80.02 Category:Physics, Applied
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Registration No. : A20040501
JAEA Abstracts No. : 330262
Paper Submission No. : 21643

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