Refine your search�ソスF     
Report No.
 - 

Optimization of Si Content in Hastelloy-XR for Oxidation Resistance and Oxide Film Adherence During Oxidation in VHTR Helium

Shindo, Masami; Kondo, Tatsuo

no abstracts in English

Acecsses

:

- Accesses

InCites™

:

Altmetrics

:

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.