Modification of thin SIMOX film into -FeSi via dry processes

Shimura, Kenichiro; Yamaguchi, Kenji; Sasase, Masato*; Yamamoto, Hiroyuki; Shamoto, Shinichi ; Hojo, Kiichi

no abstracts in English

Language	:	English
Journal	:	Nuclear Instruments and Methods in Physics Research B
Volume	:	242
Number	:	1-2
Pages	:	p.676 - 678
Publication Year/Month	:	2006/01
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Paper URL	:	https://doi.org/10.1016/j.nimb.2005.08.169
DOI for research data	:
Keywords	:	シリサイド系半導体; ベータ鉄シリサイド; イオンビームスパッタ蒸着法; SOI構造; テンプレート層
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Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:0.01 Category:Instruments & Instrumentation
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Registration No. : A20040659
JAEA Abstracts No. : 34000101
Paper Submission No. : 250

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