Yield of OH radicals in water under high-density energy deposition by heavy-ion irradiation

no abstracts in English

Language	:	English
Journal	:	Radiation Research
Volume	:	163
Number	:	4
Pages	:	p.455 - 461
Publication Year/Month	:	2005/04
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Paper URL	:	https://doi.org/10.1667/RR3330
DOI for research data	:
Keywords	:	重イオン; OHラジカル; 微分G値; 水溶液; フェノール; 比エネルギー; 酸化反応
Research Facility	:	TIARA(イオン照射研究施設)
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Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:57.4 Category:Biology
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Registration No. : A20040668
JAEA Abstracts No. : 330426
Paper Submission No. : 21758

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