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Report No.
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Comprehensive study on layout dependence of soft errors in CMOS latch circuits and its scaling trend for 65 nm technology node and beyond

Fukui, Hironobu*; Hamaguchi, Masafumi*; Yoshimura, Hisao*; Oyamatsu, Hisato*; Matsuoka, Fumitomo*; Noguchi, Tatsuo*; Hirao, Toshio; Abe, Hiroshi; Onoda, Shinobu; Yamakawa, Takeshi; Wakasa, Takeshi; Kamiya, Tomihiro

no abstracts in English

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