Alignment of grain orientation in polycrystalline-SiO $_{2}$ films induced by high-energy heavy ions

Shinde, N. S.*; Matsunami, Noriaki*; Shimura, Tetsuo*; Sataka, Masao; Okayasu, Satoru ; Kato, Teruo; Tazawa, Masato*

no abstracts in English

Language	:	English
Journal	:	Nuclear Instruments and Methods in Physics Research B
Volume	:	245
Number	:	1
Pages	:	p.231 - 234
Publication Year/Month	:	2006/04
Meeting title	:	6th International Symposium on Swift Heavy Ions in Matter (SHIM 2005)
Held date	:	2005/05
Location (city)	:	Aschaffenburg
Location (country)	:	Germany
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1016/j.nimb.2005.11.107
DOI for research data	:	Link to research data related to this paper/report.
Keywords	:	High Energy Heavy Ion; Xe; SiO $_{2}$ ; Alignment; Grain-orientation; XRD; AFM
Research Facility	:	タンデム加速器
Press Release	:
JAEA R&D Navigator	:
Cooperating Institute	:	名古屋大学

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:33.34 Category:Instruments & Instrumentation
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Registration No. : B20050012
JAEA Abstracts No. :
Paper Submission No. : 30385

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Alignment of grain orientation in polycrystalline-SiO films induced by high-energy heavy ions

Alignment of grain orientation in polycrystalline-SiO $_{2}$ films induced by high-energy heavy ions