Effect of thermal annealing on the photoluminescence from -FeSi films on Si substrate

Yamaguchi, Kenji; Shimura, Kenichiro; Udono, Haruhiko*; Sasase, Masato*; Yamamoto, Hiroyuki; Shamoto, Shinichi ; Hojo, Kiichi

no abstracts in English

Language	:	English
Journal	:	Thin Solid Films
Volume	:	508
Number	:	1-2
Pages	:	p.367 - 370
Publication Year/Month	:	2006/06
Meeting title	:	4th International Conference on Silicon Epitaxy and Heterostructures (ICSI-4)
Held date	:	2005/05
Location (city)	:	Awaji Island
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1016/j.tsf.2005.07.354
DOI for research data	:
Keywords	:	シリサイド系半導体; 環境半導体; ベータ鉄シリサイド; 発光特性; アニール効果; イオンビームスパッタ蒸着法; 分子線エピタキシー法
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:	茨城大学

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:49.71 Category:Materials Science, Multidisciplinary
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Registration No. : B20050084
JAEA Abstracts No. : 42001143
Paper Submission No. : 14787

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