Characterization of photoluminescence of -FeSi thin film fabricated on Si and SIMOX substrate by IBSD method

Shimura, Kenichiro; Yamaguchi, Kenji; Sasase, Masato*; Yamamoto, Hiroyuki; Shamoto, Shinichi ; Hojo, Kiichi

no abstracts in English

Language	:	English
Journal	:	Vacuum
Volume	:	80
Number	:	7
Pages	:	p.719 - 722
Publication Year/Month	:	2006/05
Meeting title	:	8th International Symposium on Sputtering and Plasma Processes (ISSP 2005)
Held date	:	2005/06
Location (city)	:	Kanazawa
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1016/j.vacuum.2005.11.034
DOI for research data	:
Keywords	:	シリサイド系半導体; 環境半導体; ベータ鉄シリサイド; 発光特性; イオンビームスパッタ蒸着法; 断面観察; 元素組成
Research Facility	:
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:	若狭湾エネルギー研究センター

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:34.33 Category:Materials Science, Multidisciplinary
Altmetrics	:

Registration No. : B20050085
JAEA Abstracts No. : 42001144
Paper Submission No. : 14788

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.