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Report No.

Development of multilayer mirrors for use in the wavelength region of 4 nm

Ishino, Masahiko; Yoda, Osamu*; Koike, Masato

We have developed soft X-ray multilayer mirrors for use around the wavelength region of 4 nm including the K-absorption edge of carbon ($$lambda = 4.4 nm$$). We have chosen Co$$_3$$O$$_4$$ and Cr as the final candidate materials for absorber layers, and SiO$$_2$$ and Sc for the spacer materials as the result of theoretical invitation. Co$$_3$$O$$_4$$/SiO$$_2$$, Co$$_3$$O$$_4$$/Sc and Cr/Sc multilayer mirrors have been fabricated by means of an ion beam sputtering (IBS) method. As the result of structure evaluations with X-ray diffraction measurement, we have found that the fabricated Co$$_3$$O$$_4$$/Sc and Cr/Sc multilayer mirrors have stable structures. Soft X-ray reflectivity measurements for fabricated multilayer mirrors are carried out in the wavelength region of 4 nm with a synchrotron radiation source. We have found that the Cr/Sc multilayer mirror has a high soft X-ray reflectivity. However, soft X-ray reflectivities below the absorption edge of carbon are reduced. The analyses obtained by EPMA and SIMS suggested that this phenomenon was attributed to contamination of carbon.



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