Numerical Analysis on Diffusion Layer at the Electrode of MOX Co-deposition in the Oxide-electrowining Process

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堺 公明; 河村 拓己*

Sakai, Takaaki; Kawamura, Takumi*

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Numerical analysis was conducted on MOX co-deposition in an oxide-electrowining process to predict the diffusion layer thickness of the boundary layer at the cathode surface. The boundary layer was calculated by using the 10 micron width mesh to evaluate the natural circulation by the mass transfer at the cathode surface. As a result, it became clear that the diffusion layer thickness calculated by the numerical analysis can be predicted by using the non-dimensional number correlations for the mass transfer. In addition, a new mass transfer correlation was proposed for the mixed convection between the natural and forced convection conditions. The numerical analysis method was applied to the MOX co-deposition condition. The deposition process depending on the cathode potential was able to be simulated successfully for both of PuO2 and UO2.