Non-destructive depth profile analysis of SiO $_{2}$ /Si layer by high-energy XPS

no abstracts in English

Language	:	English
Journal	:	Journal of Surface Analysis
Volume	:	7
Number	:	1
Pages	:	p.122 - 127
Publication Year/Month	:	2000/03
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Keywords	:	深さ方向分析; 非破壊分析; X線光電子分光法; 放射光; SiO $_{2}$ ; 3次元ナノ構造
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Registration No. : A19990473
JAEA Abstracts No. : 280721
Paper Submission No. : 17670

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Non-destructive depth profile analysis of SiO/Si layer by high-energy XPS

Non-destructive depth profile analysis of SiO $_{2}$ /Si layer by high-energy XPS