Effect of Mg ion implantation on electrical properties of CuInSe $_{2}$ thin films

Tanaka, Toru*; Wakahara, Akihiro*; Yoshida, Akira*; Oshima, Takeshi; Ito, Hisayoshi; Okada, Sohei

no abstracts in English

Language	:	English
Journal	:	Journal of Applied Physics
Volume	:	87
Number	:	7
Pages	:	p.3283 - 3286
Publication Year/Month	:	2000/01
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Paper URL	:	https://doi.org/10.1063/1.372337
DOI for research data	:	Link to research data related to this paper/report.
Keywords	:	カルコパイライト半導体; イオン注入; 不純物ドーピング; ホール係数測定
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Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:46.47 Category:Physics, Applied
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Registration No. : A19990480
JAEA Abstracts No. : 280297
Paper Submission No. : 17294

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Effect of Mg ion implantation on electrical properties of CuInSe thin films

Effect of Mg ion implantation on electrical properties of CuInSe $_{2}$ thin films