DNA damage induced by the direct effect of He ion particles

Urushibara, Ayumi; Shikazono, Naoya; Watanabe, Ritsuko; Fujii, Kentaro; O'Neill, P.*; Yokoya, Akinari

no abstracts in English

Language	:	English
Journal	:	Radiation Protection Dosimetry
Volume	:	122
Number	:	1-4
Pages	:	p.163 - 165
Publication Year/Month	:	2006/12
Meeting title	:	14th Symposium on Microdosimetry
Held date	:	2005/11
Location (city)	:	Venezia
Location (country)	:	Italy
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.1093/rpd/ncl425
DOI for research data	:
Keywords	:	no keyword
Research Facility	:	TIARA(イオン照射研究施設)
Press Release	:
Article of JAEA R&D Review	:	Dependence of Yield of DNA Damage Refractory to Enzymatic Repair on Ionization & Excitation Density of Radiation; Exploring the Induction Mechanism of Clustered DNA Damage[/]
Cooperating Institute	:

Accesses	:	- Accesses
Web of Science® Times Cited Count	:	Times Cited Count： If you would like to get the latest times cited, please access the Web of Science®. http://www.webofknowledge.com/wos
InCites™	:	Percentile:30.68 Category:Environmental Sciences
Altmetrics	:

Registration No. : BB20050181
JAEA Abstracts No. : 35001204
Paper Submission No. : 2794

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.