Passive oxidation of Si(001) by hyperthermal atomic oxygen beam; A Synchrotron radiation photoemission spectroscopic study

Tagawa, Masahito*; Sogo, Chie*; Miyagai, Suguru*; Yokota, Kumiko*; Yoshigoe, Akitaka ; Teraoka, Yuden

Ultra-thin oxide-layers on Si(001) surfaces, formed by an atomic oxygen beam with hyperthermal incident energy, were analysed by photoemission spectroscopy with synchrotron radiation. The formation of ultra-thin oxide-layers was performed in Kobe University. The photoemission spectroscopy was performed at the surface chemistry experimental station installed in the JAEA soft X-ray beamline in the SPring-8. Comparing the photoemission spectra with those of thermal oxidation with oxygen gas, it was found that a few suboxides were observed in the ultra-thin oxide-layers formed by atomic oxygem beams.

Language	:	English
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Meeting title	:	International Symposium on Application of Quantum Beam 2005
Held date	:	2005/10
Location (city)	:	Kobe
Location (country)	:	Japan
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DOI for research data	:
Keywords	:	no keyword
Research Facility	:	SPring-8(大型放射光施設)
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Article of JAEA R&D Review	:
Cooperating Institute	:	神戸大学

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Registration No. : BB20050082
JAEA Abstracts No. :
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