線照射による水溶液からの水素生成; 酸化物,硫酸,アルコール添加効果

Hydrogen formation in aqueous solutions by -ray irradiation; Effects of the addition of oxide, sulfuric acid, and alcohol

山田 禮司; 永石 隆二 ; 籏野 嘉彦; 吉田 善行

Yamada, Reiji; Nagaishi, Ryuji; Hatano, Yoshihiko; Yoshida, Zenko

線照射により水溶液中で発生し気相に放出された水素ガスをガスクロマトグラフで測定し、酸化物,硫酸,メチルアルコールの添加効果を調べた。放出水素ガスは酸化物粉体の増加とともに増加し、その硫酸濃度依存性は酸化物の添加量に強く依存する結果を得た。また少量のアルコールの添加により水素発生量は増加し、硫酸及び酸化物が共存する場合に放出水素ガス量は最大となった。

H gas released to the gas phase in a sample was measured with gas chromatography after H gas was formed in aqueous solution by -ray irradiation. The experimental results for oxide, sulfuric acid, and alcohol additives in aqueous solution revealed that the H gas increased with increasing the amount of oxide and that the dependence of H gas production on HSO concentration was strongly affected by the amount of oxide. The small amount of alcohol addition increased the H production yield, which took a maximum when an aqueous solution contained sulfuric acid and oxide.