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Report No.
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Hydrogen incorporation and gasochromic coloration of tungsten oxide films

Nagata, Shinji*; Inoue, Aichi; Yamamoto, Shunya; Tsuchiya, Bun*; Takano, Katsuyoshi; To, Kentaro*; Shikama, Tatsuo*

The effect of the composition of non-stoichiometric WO$$_{3}$$ films on the gasochromic coloration are investigated. The films are prepared by a reactive RF magnetron sputtering with varying oxygen partial pressure. To determine the quantitative composition of deposited films, Rutherford backscattering spectroscopy (RBS) and Elastic recoil detection (ERD) are employed. Gasochromic coloration of the films coated with Pd catalyst is examined by optical transmission in hydrogen gas. O/W atomic ratio of the films increases from 0.25 to 3.0 with increasing the oxygen partial pressure in the sputtering gas. H/W ratio increases up to 0.7 with increasing the O/W ration. As regards gasochromic coloration, the film with O/W atomic ratio of 3.0 shows superior coloration performance comparing with that of less than 3.0. Therefore, it is assumed that the good gasochromic coloration of tungsten oxide films is realized by near-stoichiometric WO$$_{3}$$. In addition, gasochromic coloration state, increasing of hydrogen concentration in WO$$_{3}$$ films is observed. It indicates that gasochromic coloration of WO$$_{3}$$ is relate to formation of HWO$$_{3}$$ structure.

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Category:Chemistry, Physical

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