Thermal preannealing of single crystalline -FeSi $_{2}$ substrate for MBE

Ouchi, Shinji*; Muroga, Masataka*; Udono, Haruhiko*; Yamada, Yoichi; Yamamoto, Hiroyuki; Kikuma, Isao*

Thermal preannealing of single crystalline -FeSi $_{2}$ substrate for MBE has been investigated to obtain better substrate for homo-epitaxial growth of -FeSi $_{2}$ film.

Language	:	Japanese
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Meeting title	:	2007年(平成19年)春季第54回応用物理学関係連合講演会
Held date	:	2007/03
Location (city)	:	相模原
Location (country)	:	日本
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Keywords	:	no keyword
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Registration No. : BB20062991
JAEA Abstracts No. :
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Thermal preannealing of single crystalline -FeSi substrate for MBE

Thermal preannealing of single crystalline -FeSi $_{2}$ substrate for MBE