Plasma enhanced chemical vapor deposition of B-C-N films

Mannan, M. A.*; Kida, Tetsuya*; Nagano, Masamitsu*; Hirao, Norie*; Baba, Yuji  

B-C-N hybrid thin films were synthesized by plasma enhanced chemical vapor deposition using liquid organic molecules (tris-dimethylamine borane and trimethylamine borane) as molecular precursors. The Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy investigations suggest that the films are composed of hybridized boron, carbon and nitrogen atoms. The X-ray diffraction and field emission scanning electron microscopy investigations reveal that the films are almost amorphous and have micro-structure at 4.2-4.5 m. The micro-hardness of the as-deposited B-C-N films is found to be approximately 2-7 Gpa. It was concluded that the plasma enhanced chemical vapor deposition using the present organic molecules are suited for the synthesis of B-C-N hybrid thin films.